Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates
نویسندگان
چکیده
منابع مشابه
Hard-X-ray Zone Plates: Recent Progress
The technology to focus hard-X-rays (photon energy larger than 1–2 keV) has made great progress in the past three years. The progress was particularly spectacular for lenses based on the Fresnel zone plate concept. The spatial resolution notably increased by a factor of three, opening up entirely new domains of application, specifically in biomedical research. As we shall see, this evolution is...
متن کاملFabrication of Fresnel zone plates for hard X-rays
A method to fabricate gold structures with high aspect ratio is presented. Fresnel zone plates with an outermost zone width of 100 nm and structures of 1 lm height are fabricated. Preliminary focusing results at an X-ray energy of 8 keV are presented and ways to improve the zone plate parameters are discussed. 2007 Elsevier B.V. All rights reserved.
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Hard x-ray nanoimaging enables structural investigations of newmaterials for many applications. For high-resolution experiments, zone plate x-ray optics are commonly chosen. Two methods of zone plate nanofabrication are presented in this thesis. Zone plates are circular diffraction gratings with radially decreasing grating period. Their optical resolution depends on the width of the smallest zo...
متن کاملZone Plates for Hard X-Ray Free-Electron Lasers
Hard x-ray free-electron lasers are novel sources of coherent x-rays with unprecedented brightness and very short pulses. The radiation from these sources enables a wide range of new experiments that were not possible with previous x-ray sources. Many of these experiments require the possibility to focus the intense x-ray beam onto small samples. This Thesis investigates the possibility to use ...
متن کاملNew diamond nanofabrication process for hard x-ray zone plates
The authors report on a new tungsten-hardmask-based diamond dry-etch process for fabricating diamond zone plate lenses with a high aspect ratio. The tungsten hardmask is structured by electronbeam lithography, together with Cl2/O2 and SF6/O2 reactive ion etching in a trilayer resist-chromiumtungsten stack. The underlying diamond is then etched in an O2 plasma. The authors demonstrate excellent-...
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ژورنال
عنوان ژورنال: Micromachines
سال: 2020
ISSN: 2072-666X
DOI: 10.3390/mi11030301